Selective placement of single-walled carbon nanotubes on pre-defined micro-patterns on SiO2 surface based on a dry lift-off technique
- Authors
- Tran, Thu Hong; Lee, Kyong Soo; Lee, Jin Woo; Ju, Byeong-Kwon
- Issue Date
- 1월-2009
- Publisher
- ELSEVIER SCIENCE BV
- Keywords
- Nanomaterial; Poly-para-xylylene C; Dry lift-off removal; Deposition; Micro-scale patterns
- Citation
- CURRENT APPLIED PHYSICS, v.9, pp.S38 - S42
- Indexed
- SCIE
SCOPUS
KCI
- Journal Title
- CURRENT APPLIED PHYSICS
- Volume
- 9
- Start Page
- S38
- End Page
- S42
- URI
- https://scholar.korea.ac.kr/handle/2021.sw.korea/120822
- DOI
- 10.1016/j.cap.2008.08.047
- ISSN
- 1567-1739
- Abstract
- We reported a new technique for self-assembly of selective placement of carbon nanotubes (CNT) on pre-defined micro-patterns. Our work based on the use of a poly-para-xylylene C passivation layer on silicon dioxide NOD surface which was micro-patterned by reactive ion etching (RIE) process and follow by the CNT deposition step. The lift-off of poly-para-xylylene layer then was carried out relying on a dry lift-off method in order to remove the nanotubes adsorbed on the poly-para-xylylene layer leaving the CNT on the desirable areas. CNT located at specific micro-areas with pre-defined patterns from 50 mu m down to less than 10 mu m line width and variable shapes. This approach provides a simple and useful means allow controlled placement of CNT which is necessary for the large-scale fabrication of electronic devices. (C) 2008 Elsevier B.V. All rights reserved.
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