Synthesis of novel platinum precursor and its application to metal organic chemical vapor deposition of platinum thin films
- Authors
- Lee, Sun Sook; Lee, Ho-Min; Park, Min-Jung; An, Ki-Seok; Kim, Jinkwon; Lee, Jong-Heun; Chung, Taek-Mo; Kim, Chang Gyoun
- Issue Date
- 8월-2008
- Publisher
- WILEY-V C H VERLAG GMBH
- Keywords
- platinum; precursor; MOCVD; aminoalkoxide; thin films
- Citation
- BULLETIN OF THE KOREAN CHEMICAL SOCIETY, v.29, no.8, pp.1491 - 1494
- Indexed
- SCIE
SCOPUS
KCI
- Journal Title
- BULLETIN OF THE KOREAN CHEMICAL SOCIETY
- Volume
- 29
- Number
- 8
- Start Page
- 1491
- End Page
- 1494
- URI
- https://scholar.korea.ac.kr/handle/2021.sw.korea/122924
- ISSN
- 0253-2964
- Abstract
- A novel platinum aminoalkoxide complex, Pt(dmamp)(2) has been prepared by the reaction of cis-(py)(2)PtI2 with two equivalents of Na(dmamp) (dmamp = 1-dimethylamino-2-methyl-2-propanolate). Single-crystal X-ray crystallographic analysis shows that the Pt(dmamp)(2) complex keeps a square planar geometry with each two nitrogen atoms and two oxygen atoms having trans configuration. Platinum films have been deposited on TaN/Ta/Si substrates by metal organic chemical vapor deposition (MOCVD) using Pt(dmamp)(2). As-deposited platinum thin films did not contain any appreciable amounts of impurities except a little carbon. As the deposition temperature was increased, the films resistivity and deposition rate increased. The electrical resistivity (13.6 mu Omega cm) of Pt film deposited at 400 degrees C is a little higher than the bulk value (10.5 mu Omega cm) at 293 K. The chemical composition, crystalline structure, and morphology of the deposited films were investigated by X-ray photoelectron spectroscopy, X-ray diffraction, and atomic force microscopy.
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Collections - College of Engineering > Department of Materials Science and Engineering > 1. Journal Articles
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