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Fabrication of Sub-100 nm Sized Patterns on Curved Acryl Substrate Using a Flexible Stamp

Authors
Hong, Sung-HoonHan, Kang-SooByeon, Kyeong-JaeLee, HeonChoi, Kyung-Woo
Issue Date
May-2008
Publisher
JAPAN SOCIETY APPLIED PHYSICS
Keywords
curved substrate; flexible stamp; nickel foil stamp; hot embossing; nanoimprint
Citation
JAPANESE JOURNAL OF APPLIED PHYSICS, v.47, no.5, pp.3699 - 3701
Indexed
SCIE
SCOPUS
Journal Title
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume
47
Number
5
Start Page
3699
End Page
3701
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/123635
DOI
10.1143/JJAP.47.3699
ISSN
0021-4922
Abstract
As small as 100nm patterns were successfully transferred onto a non-planar acryl substrate using both UV nanoimprinting and hot embossing techniques. Two different types of flexible imprint stamps, electroformed nickel foil stamp and molded water soluble poly(vinyl alcohol) (PVA) stamp, were used. 100 nm line and space pattern of Si master was successfully transferred to nickel foil stamp and PVA stamp and their patterns were also transferred to the surface of curved acryl substrate using either UV nanoimprint lithography or hot embossing lithography. [DOI: 10.1143/JJAP.47.3699]
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