Fabrication of Sub-100 nm Sized Patterns on Curved Acryl Substrate Using a Flexible Stamp
- Authors
- Hong, Sung-Hoon; Han, Kang-Soo; Byeon, Kyeong-Jae; Lee, Heon; Choi, Kyung-Woo
- Issue Date
- May-2008
- Publisher
- JAPAN SOCIETY APPLIED PHYSICS
- Keywords
- curved substrate; flexible stamp; nickel foil stamp; hot embossing; nanoimprint
- Citation
- JAPANESE JOURNAL OF APPLIED PHYSICS, v.47, no.5, pp.3699 - 3701
- Indexed
- SCIE
SCOPUS
- Journal Title
- JAPANESE JOURNAL OF APPLIED PHYSICS
- Volume
- 47
- Number
- 5
- Start Page
- 3699
- End Page
- 3701
- URI
- https://scholar.korea.ac.kr/handle/2021.sw.korea/123635
- DOI
- 10.1143/JJAP.47.3699
- ISSN
- 0021-4922
- Abstract
- As small as 100nm patterns were successfully transferred onto a non-planar acryl substrate using both UV nanoimprinting and hot embossing techniques. Two different types of flexible imprint stamps, electroformed nickel foil stamp and molded water soluble poly(vinyl alcohol) (PVA) stamp, were used. 100 nm line and space pattern of Si master was successfully transferred to nickel foil stamp and PVA stamp and their patterns were also transferred to the surface of curved acryl substrate using either UV nanoimprint lithography or hot embossing lithography. [DOI: 10.1143/JJAP.47.3699]
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- Appears in
Collections - College of Engineering > Department of Materials Science and Engineering > 1. Journal Articles
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