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Fabrication of nano-hole array patterns on transparent conducting oxide layer using thermally curable nanoimprint lithography

Authors
Byeon, Kyeong-JaeHwang, Seon-YongLee, Heon
Issue Date
May-2008
Publisher
ELSEVIER SCIENCE BV
Keywords
transparent conducting oxide (TCO) layer; indium tin oxide (ITO); nanoimprint lithography (NIL); photonic crystals; patterned transparent electrode
Citation
MICROELECTRONIC ENGINEERING, v.85, no.5-6, pp.830 - 833
Indexed
SCIE
SCOPUS
Journal Title
MICROELECTRONIC ENGINEERING
Volume
85
Number
5-6
Start Page
830
End Page
833
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/123708
DOI
10.1016/j.mee.2007.12.078
ISSN
0167-9317
Abstract
A two-dimensional, periodic array of nano-sized holes was fabricated in an indium tin oxide (ITO) layer, deposited onto a glass substrate with nanoimprint lithography. As a result of a thermally curing imprint process, hole array patterns with a diameter of 130 nm and a pitch of 520 nm were formed on the ITO surface with a near zero residual layer. After inductively coupled plasma etching process of ITO using the imprinted polymer pattern as an etch mask, a tapered-hole array pattern was fabricated on the ITO layer, thereby producing a prominent diffusion phenomenon in the near ultraviolet region. (C) 2007 Elsevier B.V. All rights reserved.
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