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Fabrication of nano-hole array patterns on transparent conducting oxide layer using thermally curable nanoimprint lithography
- Authors
- Byeon, Kyeong-Jae; Hwang, Seon-Yong; Lee, Heon
- Issue Date
- 5월-2008
- Publisher
- ELSEVIER SCIENCE BV
- Keywords
- transparent conducting oxide (TCO) layer; indium tin oxide (ITO); nanoimprint lithography (NIL); photonic crystals; patterned transparent electrode
- Citation
- MICROELECTRONIC ENGINEERING, v.85, no.5-6, pp.830 - 833
- Indexed
- SCIE
SCOPUS
- Journal Title
- MICROELECTRONIC ENGINEERING
- Volume
- 85
- Number
- 5-6
- Start Page
- 830
- End Page
- 833
- ISSN
- 0167-9317
- Abstract
- A two-dimensional, periodic array of nano-sized holes was fabricated in an indium tin oxide (ITO) layer, deposited onto a glass substrate with nanoimprint lithography. As a result of a thermally curing imprint process, hole array patterns with a diameter of 130 nm and a pitch of 520 nm were formed on the ITO surface with a near zero residual layer. After inductively coupled plasma etching process of ITO using the imprinted polymer pattern as an etch mask, a tapered-hole array pattern was fabricated on the ITO layer, thereby producing a prominent diffusion phenomenon in the near ultraviolet region. (C) 2007 Elsevier B.V. All rights reserved.
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