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Growth and piezoelectric properties of amorphous and crystalline (K1-xNax)NbO(3-)based thin films

Authors
Woo, Jong-UnKim, Sun-WooKim, Dae-SuKim, In-SuShin, Ho-SungNahm, Sahn
Issue Date
5월-2021
Publisher
SPRINGER HEIDELBERG
Keywords
K0.5Na0.5NbO3; Thin films; Ferroelectrics; Piezoelectrics; Lead-free materials
Citation
JOURNAL OF THE KOREAN CERAMIC SOCIETY, v.58, no.3, pp.249 - 268
Indexed
SCIE
SCOPUS
KCI
Journal Title
JOURNAL OF THE KOREAN CERAMIC SOCIETY
Volume
58
Number
3
Start Page
249
End Page
268
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/128127
DOI
10.1007/s43207-021-00108-6
ISSN
1229-7801
Abstract
(K1-xNax)NbO3 (KNN)-based piezoelectric thin films have been extensively studied for application in micro-electromechanical systems. However, growing homogenous crystalline (K1-xNax)NbO3 (CKNN) films with good piezoelectric properties is difficult because Na2O and K2O evaporate during the growth process at high temperatures. Recently, amorphous (K1-xNax)NbO3 (AKNN) films containing KNN nanocrystals with good piezoelectric properties have been fabricated at low temperatures. Furthermore, [001]-oriented crystalline (K1-xNax)NbO3 (OCKNN) films with excellent piezoelectric properties have been grown at low temperatures (<= 350 degrees C) using a metal-oxide nanosheet seed layer. This novel method is excellent for the growth of homogeneous KNN thin films. These films were deposited on a polymer substrate; thus, they can be utilized in future flexible electronic devices. In this study, the structural and piezoelectric properties of AKNN- and CKNN-based films fabricated at high temperatures, along with the growth process and application of OCKNN-based thin films at low temperatures, are reviewed.
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