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Hysteresis Modulation on Van der Waals-Based Ferroelectric Field-Effect Transistor by Interfacial Passivation Technique and Its Application in Optic Neural Networks

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dc.contributor.authorJeon, Hyeok-
dc.contributor.authorKim, Seung-Geun-
dc.contributor.authorPark, June-
dc.contributor.authorKim, Seung-Hwan-
dc.contributor.authorPark, Euyjin-
dc.contributor.authorKim, Jiyoung-
dc.contributor.authorYu, Hyun-Yong-
dc.date.accessioned2021-12-08T12:43:03Z-
dc.date.available2021-12-08T12:43:03Z-
dc.date.created2021-08-30-
dc.date.issued2020-12-
dc.identifier.issn1613-6810-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/130329-
dc.description.abstract2D semiconductor-based ferroelectric field effect transistors (FeFETs) have been considered as a promising artificial synaptic device for implementation of neuromorphic computing systems. However, an inevitable problem, interface traps at the 2D semiconductor/ferroelectric oxide interface, suppresses ferroelectric characteristics, and causes a critical degradation on the performance of 2D-based FeFETs. Here, hysteresis modulation method using self-assembly monolayer (SAM) material for interface trap passivation on 2D-based FeFET is presented. Through effectively passivation of interface traps by SAM layer, the hysteresis of the proposed device changes from interface traps-dependent to polarization-dependent direction. The reduction of interface trap density is clearly confirmed through the result of calculation using the subthreshold swing of the device. Furthermore, excellent optic-neural synaptic characteristics are successfully implemeted, including linear and symmetric potentiation and depression, and multilevel conductance. This work identifies the potential of passivation effect for 2D-based FeFETs to accelerate the development of neuromorphic computing systems.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherWILEY-V C H VERLAG GMBH-
dc.subjectBEHAVIOR-
dc.titleHysteresis Modulation on Van der Waals-Based Ferroelectric Field-Effect Transistor by Interfacial Passivation Technique and Its Application in Optic Neural Networks-
dc.typeArticle-
dc.contributor.affiliatedAuthorYu, Hyun-Yong-
dc.identifier.doi10.1002/smll.202004371-
dc.identifier.scopusid2-s2.0-85097032923-
dc.identifier.wosid000589954500001-
dc.identifier.bibliographicCitationSMALL, v.16, no.49-
dc.relation.isPartOfSMALL-
dc.citation.titleSMALL-
dc.citation.volume16-
dc.citation.number49-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryChemistry, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryChemistry, Physical-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.subject.keywordPlusBEHAVIOR-
dc.subject.keywordAuthor2D&amp-
dc.subject.keywordAuthor#8208-
dc.subject.keywordAuthorbased ferroelectric field effect transistors-
dc.subject.keywordAuthorHfO2&amp-
dc.subject.keywordAuthor#8208-
dc.subject.keywordAuthorbased ferroelectric materials-
dc.subject.keywordAuthoroptic&amp-
dc.subject.keywordAuthor#8208-
dc.subject.keywordAuthorneural synapses-
dc.subject.keywordAuthorpassivation effects-
dc.subject.keywordAuthor2D materials-
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