Electrical Stability of p-Channel Feedback Field-Effect Transistors Under Bias Stresses
DC Field | Value | Language |
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dc.contributor.author | Son, Jaemin | - |
dc.contributor.author | Cho, Kyoungah | - |
dc.contributor.author | Kim, Sangsig | - |
dc.date.accessioned | 2022-03-12T00:40:19Z | - |
dc.date.available | 2022-03-12T00:40:19Z | - |
dc.date.created | 2022-01-20 | - |
dc.date.issued | 2021 | - |
dc.identifier.issn | 2169-3536 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/138657 | - |
dc.description.abstract | In this study, we examined electrical stability of the p-channel feedback field-effect transistors (FBFETs) under negative bias stress (NBS) and positive bias stress (PBS). The intact FBFETs have a subthreshold swing (SS) of 0.12 mV/dec, an on-current of similar to 10(-4) A, and a threshold voltage (V-TH) of -0.76V. There is a negligible change in the on-current and SS when the FBFETs are stressed by a gate-bias voltage corresponding to an electric field of 5.4 MV/cm across the gate oxide. On the other hand, as the duration of the stress increases to 1000 s, the VTH shifts to -0.89 V and -0.67 V for NBS and PBS, respectively. The V-TH was recovered to over 83% at a recovery bias voltage of +/- 5 V. The electrical stabilities of FBFETs under NBS and PBS are discussed in this study. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC | - |
dc.subject | MEMORY | - |
dc.subject | STATES | - |
dc.title | Electrical Stability of p-Channel Feedback Field-Effect Transistors Under Bias Stresses | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Kim, Sangsig | - |
dc.identifier.doi | 10.1109/ACCESS.2021.3108232 | - |
dc.identifier.scopusid | 2-s2.0-85113832774 | - |
dc.identifier.wosid | 000692224700001 | - |
dc.identifier.bibliographicCitation | IEEE ACCESS, v.9, pp.119402 - 119405 | - |
dc.relation.isPartOf | IEEE ACCESS | - |
dc.citation.title | IEEE ACCESS | - |
dc.citation.volume | 9 | - |
dc.citation.startPage | 119402 | - |
dc.citation.endPage | 119405 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Computer Science | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Telecommunications | - |
dc.relation.journalWebOfScienceCategory | Computer Science, Information Systems | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.relation.journalWebOfScienceCategory | Telecommunications | - |
dc.subject.keywordPlus | MEMORY | - |
dc.subject.keywordPlus | STATES | - |
dc.subject.keywordAuthor | Field-effect transistor | - |
dc.subject.keywordAuthor | positive feedback loop | - |
dc.subject.keywordAuthor | reliability | - |
dc.subject.keywordAuthor | bias stress | - |
dc.subject.keywordAuthor | recovery | - |
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