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High Temperature Characterization of High-K/Metal-Gate 2-Stacked Gate-AllAround Nanowire FET Versus FinFETHigh Temperature Characterization of High-K/Metal-Gate 2-Stacked Gate-AllAround Nanowire FET Versus FinFET
- Alternative Title
- High Temperature Characterization of High-K/Metal-Gate 2-Stacked Gate-AllAround Nanowire FET Versus FinFET
- Authors
- LEE Jae Woo
- Issue Date
- 14-2월-2019
- Publisher
- 한국반도체산업협회
- Citation
- 제 26회 한국 반도체 학술대회
- Conference Name
- 제 26회 한국 반도체 학술대회
- Place
- KO
- Conference Date
- 2019-02-13
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