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Memory TFT Application: Under 150 °C, Low Temperature Processed Oxide TFT with Mobile Proton Inserted Gate Dielectric for Stretchable AMOLEDMemory TFT Application: Under 150 °C, Low Temperature Processed Oxide TFT with Mobile Proton Inserted Gate Dielectric for Stretchable AMOLED

Alternative Title
Memory TFT Application: Under 150 °C, Low Temperature Processed Oxide TFT with Mobile Proton Inserted Gate Dielectric for Stretchable AMOLED
Authors
Hong MunPyo
Issue Date
31-8월-2017
Publisher
The Korean information Display Society (KIDS), The Society for Information Display (SID), Korea Disp
Citation
iMiD2017
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/22728
Conference Name
iMiD2017
Place
KO
Conference Date
2017-08-28
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Graduate School > Department of Applied Physics > 2. Conference Papers

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