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Precise control over oxygen impurities in nano-crystalline silicon thin film processed with a low hydrogen dilution gas system at near room temperaturePrecise control over oxygen impurities in nano-crystalline silicon thin film processed with a low hydrogen dilution gas system at near room temperature
- Alternative Title
- Precise control over oxygen impurities in nano-crystalline silicon thin film processed with a low hydrogen dilution gas system at near room temperature
- Authors
- Hong MunPyo
- Issue Date
- 13-8월-2015
- Publisher
- North Sea Conference & Journal LTD
- Citation
- ECM4 -4th International Symposium on Energy Challenges and Mechanics
- Conference Name
- ECM4 -4th International Symposium on Energy Challenges and Mechanics
- Place
- UK
- Conference Date
- 2015-08-11
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Collections - Graduate School > Department of Applied Physics > 2. Conference Papers
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