Detailed Information

Cited 0 time in webofscience Cited 0 time in scopus
Metadata Downloads

Overcomeing limitations of hydrogen plasma treatment on the gate insulator surface of bottom gate structured nc-Si TFTs

Full metadata record
DC Field Value Language
dc.contributor.authorHong MunPyo-
dc.date.accessioned2021-08-29T03:43:56Z-
dc.date.available2021-08-29T03:43:56Z-
dc.date.created2021-04-22-
dc.date.issued2015-02-26-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/35875-
dc.publisheruniversite de RENNES-
dc.titleOvercomeing limitations of hydrogen plasma treatment on the gate insulator surface of bottom gate structured nc-Si TFTs-
dc.title.alternativeOvercomeing limitations of hydrogen plasma treatment on the gate insulator surface of bottom gate structured nc-Si TFTs-
dc.typeConference-
dc.contributor.affiliatedAuthorHong MunPyo-
dc.identifier.bibliographicCitationITC2015 - 11th International Thin-Film Transistor Conference-
dc.relation.isPartOfITC2015 - 11th International Thin-Film Transistor Conference-
dc.relation.isPartOfITC2015 - 11th International Thin-Film Transistor Conference-
dc.citation.titleITC2015 - 11th International Thin-Film Transistor Conference-
dc.citation.conferencePlaceFR-
dc.citation.conferenceDate2015-02-26-
dc.type.rimsCONF-
dc.description.journalClass1-
Files in This Item
There are no files associated with this item.
Appears in
Collections
Graduate School > Department of Applied Physics > 2. Conference Papers

qrcode

Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.

Related Researcher

Researcher Hong, Mun Pyo photo

Hong, Mun Pyo
응용물리학과
Read more

Altmetrics

Total Views & Downloads

BROWSE