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Overcomeing limitations of hydrogen plasma treatment on the gate insulator surface of bottom gate structured nc-Si TFTsOvercomeing limitations of hydrogen plasma treatment on the gate insulator surface of bottom gate structured nc-Si TFTs

Alternative Title
Overcomeing limitations of hydrogen plasma treatment on the gate insulator surface of bottom gate structured nc-Si TFTs
Authors
Hong MunPyo
Issue Date
26-2월-2015
Publisher
universite de RENNES
Citation
ITC2015 - 11th International Thin-Film Transistor Conference
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/35875
Conference Name
ITC2015 - 11th International Thin-Film Transistor Conference
Place
FR
Conference Date
2015-02-26
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