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Effect of negative oxygen ion bombardment during plasma sputtering process as a cruvial origin of deep defect related instability of InGaZnO thin film transistor
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Hong MunPyo | - |
| dc.date.accessioned | 2021-08-29T03:43:58Z | - |
| dc.date.available | 2021-08-29T03:43:58Z | - |
| dc.date.created | 2021-04-22 | - |
| dc.date.issued | 2015-02-26 | - |
| dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/35876 | - |
| dc.publisher | universite de RENNES | - |
| dc.title | Effect of negative oxygen ion bombardment during plasma sputtering process as a cruvial origin of deep defect related instability of InGaZnO thin film transistor | - |
| dc.title.alternative | Effect of negative oxygen ion bombardment during plasma sputtering process as a cruvial origin of deep defect related instability of InGaZnO thin film transistor | - |
| dc.type | Conference | - |
| dc.contributor.affiliatedAuthor | Hong MunPyo | - |
| dc.identifier.bibliographicCitation | ITC2015 - 11th International Thin-Film Transistor Conference | - |
| dc.relation.isPartOf | ITC2015 - 11th International Thin-Film Transistor Conference | - |
| dc.relation.isPartOf | ITC2015 - 11th International Thin-Film Transistor Conference | - |
| dc.citation.title | ITC2015 - 11th International Thin-Film Transistor Conference | - |
| dc.citation.conferencePlace | FR | - |
| dc.citation.conferenceDate | 2015-02-26 | - |
| dc.type.rims | CONF | - |
| dc.description.journalClass | 1 | - |
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