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Effects of the Bombardment of Negative Oxygen lons on Gate Bias Stability of InGaZnO Thin Film Transistors

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dc.contributor.authorHong MunPyo-
dc.date.accessioned2021-08-29T08:25:01Z-
dc.date.available2021-08-29T08:25:01Z-
dc.date.created2021-04-22-
dc.date.issued2014-10-07-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/38582-
dc.publisherthe Eletrochemical Society-
dc.titleEffects of the Bombardment of Negative Oxygen lons on Gate Bias Stability of InGaZnO Thin Film Transistors-
dc.title.alternativeEffects of the Bombardment of Negative Oxygen lons on Gate Bias Stability of InGaZnO Thin Film Transistors-
dc.typeConference-
dc.contributor.affiliatedAuthorHong MunPyo-
dc.identifier.bibliographicCitation226th ECS Meeting-
dc.relation.isPartOf226th ECS Meeting-
dc.relation.isPartOf226th ECS Meeting-
dc.citation.title226th ECS Meeting-
dc.citation.conferencePlaceMX-
dc.citation.conferenceDate2014-10-05-
dc.type.rimsCONF-
dc.description.journalClass1-
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