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Charge Transport and Dopant Location Study of High Doping and Highly Crystallized Mixed Phase Nano-Crystal Silicon Thin Film by Neutral Beam Assisted CVD Process Near Room Temperature Deposition

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dc.contributor.authorHong MunPyo-
dc.date.accessioned2021-08-29T14:29:02Z-
dc.date.available2021-08-29T14:29:02Z-
dc.date.created2021-04-22-
dc.date.issued2013-12-02-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/42294-
dc.publisherMATERIALS RESEARCH SOCIETY-
dc.titleCharge Transport and Dopant Location Study of High Doping and Highly Crystallized Mixed Phase Nano-Crystal Silicon Thin Film by Neutral Beam Assisted CVD Process Near Room Temperature Deposition-
dc.typeConference-
dc.contributor.affiliatedAuthorHong MunPyo-
dc.identifier.bibliographicCitation2013 MRS FALL MEETING PROGRAM & EXHIBIT-
dc.relation.isPartOf2013 MRS FALL MEETING PROGRAM & EXHIBIT-
dc.relation.isPartOf2013 MRS FALL MEETING PROGRAM & EXHIBIT-
dc.citation.title2013 MRS FALL MEETING PROGRAM & EXHIBIT-
dc.citation.conferencePlaceUS-
dc.citation.conferenceDate2013-12-01-
dc.type.rimsCONF-
dc.description.journalClass1-
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