Charge Transport and Dopant Location Study of High Doping and Highly Crystallized Mixed Phase Nano-Crystal Silicon Thin Film by Neutral Beam Assisted CVD Process Near Room Temperature Deposition
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
(02841) 서울특별시 성북구 안암로 14502-3290-1114
COPYRIGHT © 2021 Korea University. All Rights Reserved.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.