Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
New Approaches for overcoming Current Issues of Plasma Sputtering Process During Organic-electronics Device Fabrication: Plasma Damage Free and Room Temperature Process for High Quality Metal Oxide Thin Film
Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Hong MunPyo | - |
| dc.date.accessioned | 2021-08-29T20:48:39Z | - |
| dc.date.available | 2021-08-29T20:48:39Z | - |
| dc.date.created | 2021-04-22 | - |
| dc.date.issued | 2012-02-09 | - |
| dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/46174 | - |
| dc.publisher | (사)한국진공학회(KVS) | - |
| dc.subject | Plasma Damage Free Sputter, Low TemperatureProcess, TCO, AOS, Gas Barrier | - |
| dc.title | New Approaches for overcoming Current Issues of Plasma Sputtering Process During Organic-electronics Device Fabrication: Plasma Damage Free and Room Temperature Process for High Quality Metal Oxide Thin Film | - |
| dc.type | Conference | - |
| dc.contributor.affiliatedAuthor | Hong MunPyo | - |
| dc.identifier.bibliographicCitation | 제42회 동계학술대회 | - |
| dc.relation.isPartOf | 제42회 동계학술대회 | - |
| dc.relation.isPartOf | 제 42회 한국진공학회 동계 정기 학술대회 프로그램집 | - |
| dc.citation.title | 제42회 동계학술대회 | - |
| dc.citation.conferencePlace | KO | - |
| dc.citation.conferencePlace | 보광휘닉스파크(강원도평창) | - |
| dc.citation.conferenceDate | 2012-02-08 | - |
| dc.type.rims | CONF | - |
| dc.description.journalClass | 2 | - |
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - Graduate School > Department of Applied Physics > 2. Conference Papers
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.