Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
New Approaches for overcoming Current Issues of Plasma Sputtering Process During Organic-electronics Device Fabrication: Plasma Damage Free and Room Temperature Process for High Quality Metal Oxide Thin Film
- Authors
- Hong MunPyo
- Keywords
- Plasma Damage Free Sputter, Low TemperatureProcess, TCO, AOS, Gas Barrier
- Issue Date
- 9-2월-2012
- Publisher
- (사)한국진공학회(KVS)
- Citation
- 제42회 동계학술대회
- Conference Name
- 제42회 동계학술대회
- Place
- KO
보광휘닉스파크(강원도평창)
- Conference Date
- 2012-02-08
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - Graduate School > Department of Applied Physics > 2. Conference Papers
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.