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Effect of plasma pretreatment on the direction in a chemical vapor deposition of copper using Cu(dmamb)2Effect of plasma pretreatment on the direction in a chemical vapor deposition of copper using Cu(dmamb)2
- Alternative Title
- Effect of plasma pretreatment on the direction in a chemical vapor deposition of copper using Cu(dmamb)2
- Authors
- BYUN, Dong Jin
- Issue Date
- 7-12월-2011
- Publisher
- The Korea Physical Society
- Citation
- The 7th International Conference on Advanced Materials and Devices
- Conference Name
- The 7th International Conference on Advanced Materials and Devices
- Place
- KO
- Conference Date
- 2011-12-07
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