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Novel deposition technology for nano-crystalline silicon thin film at low temperature by reactive particle beam assisted CVD system
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Hong MunPyo | - |
| dc.date.accessioned | 2021-08-30T08:52:18Z | - |
| dc.date.available | 2021-08-30T08:52:18Z | - |
| dc.date.created | 2021-04-22 | - |
| dc.date.issued | 2009-03-05 | - |
| dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/51657 | - |
| dc.publisher | Ecole Polytechnique, Centre national de la recherche scientifique(CNRS) and the Society for Information Display (SID) | - |
| dc.subject | TFT, Low temperature, CVD | - |
| dc.title | Novel deposition technology for nano-crystalline silicon thin film at low temperature by reactive particle beam assisted CVD system | - |
| dc.type | Conference | - |
| dc.contributor.affiliatedAuthor | Hong MunPyo | - |
| dc.identifier.bibliographicCitation | 2009 International Thin Film Transistors Conference, pp.47 - 50 | - |
| dc.relation.isPartOf | 2009 International Thin Film Transistors Conference | - |
| dc.relation.isPartOf | ITC 2009 Proceeding | - |
| dc.citation.title | 2009 International Thin Film Transistors Conference | - |
| dc.citation.startPage | 47 | - |
| dc.citation.endPage | 50 | - |
| dc.citation.conferencePlace | FR | - |
| dc.citation.conferencePlace | Ecole Polytechnique, Paris, France | - |
| dc.citation.conferenceDate | 2009-03-05 | - |
| dc.type.rims | CONF | - |
| dc.description.journalClass | 1 | - |
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