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The Deposition of Amorphous Carbon Thin Film for Hard Mask Applications by Reactive Particle Beam Assisted Sputtering Process
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Hong MunPyo | - |
| dc.date.accessioned | 2021-08-31T00:25:34Z | - |
| dc.date.available | 2021-08-31T00:25:34Z | - |
| dc.date.created | 2021-04-22 | - |
| dc.date.issued | 2008-08-20 | - |
| dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/55928 | - |
| dc.publisher | The Korean Vacuum Society(한국진공학회) | - |
| dc.subject | Carbon Hard Mask, Sputter, Reactive Particle Beam | - |
| dc.title | The Deposition of Amorphous Carbon Thin Film for Hard Mask Applications by Reactive Particle Beam Assisted Sputtering Process | - |
| dc.type | Conference | - |
| dc.contributor.affiliatedAuthor | Hong MunPyo | - |
| dc.identifier.bibliographicCitation | 2008 INTERNATIONAL CONFERENCE ON MICROELECTROICS AND PLASMA TECHNOLOGY, pp.436 | - |
| dc.relation.isPartOf | 2008 INTERNATIONAL CONFERENCE ON MICROELECTROICS AND PLASMA TECHNOLOGY | - |
| dc.relation.isPartOf | THE 1st INTERNATIONAL CONFERENCE ON MICROELECTROICS AND PLASMA TECHNOLOGY (Proceeding) | - |
| dc.citation.title | 2008 INTERNATIONAL CONFERENCE ON MICROELECTROICS AND PLASMA TECHNOLOGY | - |
| dc.citation.startPage | 436 | - |
| dc.citation.endPage | 436 | - |
| dc.citation.conferencePlace | KO | - |
| dc.citation.conferencePlace | Ramada Plaza Jeju Hotel, Jeju, Korea | - |
| dc.citation.conferenceDate | 2008-08-18 | - |
| dc.type.rims | CONF | - |
| dc.description.journalClass | 2 | - |
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