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The Deposition of Amorphous Carbon Thin Film for Hard Mask Applications by Reactive Particle Beam Assisted Sputtering Process
- Authors
- Hong MunPyo
- Keywords
- Carbon Hard Mask, Sputter, Reactive Particle Beam
- Issue Date
- 20-8월-2008
- Publisher
- The Korean Vacuum Society(한국진공학회)
- Citation
- 2008 INTERNATIONAL CONFERENCE ON MICROELECTROICS AND PLASMA TECHNOLOGY, pp.436
- Conference Name
- 2008 INTERNATIONAL CONFERENCE ON MICROELECTROICS AND PLASMA TECHNOLOGY
- Place
- KO
Ramada Plaza Jeju Hotel, Jeju, Korea
- Conference Date
- 2008-08-18
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- Appears in
Collections - Graduate School > Department of Applied Physics > 2. Conference Papers
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