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Alpha Particle Irradiation of High Aluminum Content AlGan Polarization Doped Field Effect Transistors

Authors
Carey, Patrick H.Ren, FanBae, JinhoKim, JihyunPearton, Stephen J.
Issue Date
13-3월-2020
Publisher
ELECTROCHEMICAL SOC INC
Citation
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, v.9, no.3
Indexed
SCIE
SCOPUS
Journal Title
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY
Volume
9
Number
3
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/57292
DOI
10.1149/2162-8777/ab8019
ISSN
2162-8769
Abstract
Alpha particle irradiation at 18 MeV was performed on high aluminum content AlGaN Polarization Doped Field Effect Transistors (POLFTs) and characterized by DC and switching measurements. The POLFETs underwent a reduction in DC saturation current of 23% and 33% at fluences of 1 x 10(13) cm(-2) and 3 x 10(13) cm(-2), respectively. Carrier removal rates in the range of 2520 cm(-1) and 7100 cm(-1) were observed, which are similar to previously reported values for GaN HEMTs. The POLFETs under 100 kHz gate lag measurement demonstrated zero degradation while compared to a traditional GaN HEMT device which suffered serious current collapse as a result of formation of a virtual gate from radiation-induced defects. (C) 2020 The Electrochemical Society ("ECS"). Published on behalf of ECS by IOP Publishing Limited.
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