PLASMA PARAMETERS AND KINETICS OF ACTIVE SPECIES IN HBr
DC Field | Value | Language |
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dc.contributor.author | Efremov, Aleksandr M. | - |
dc.contributor.author | Betelin, Vladimir B. | - |
dc.contributor.author | Kwon, Kwang-Ho | - |
dc.contributor.author | Snegirev, Dmitriy G. | - |
dc.date.accessioned | 2021-09-01T22:49:43Z | - |
dc.date.available | 2021-09-01T22:49:43Z | - |
dc.date.created | 2021-06-19 | - |
dc.date.issued | 2019 | - |
dc.identifier.issn | 0579-2991 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/68971 | - |
dc.description.abstract | In this work, we performed the combined (experimental and model-based) study of gas-phase plasma characteristics for HBr + Cl-2 + O-2 gas mixture under conditions of low-pressure inductive 13.56 MHz discharge. The data on internal plasma parameters, plasma chemistry as well as the steady-state plasma composition were obtained using a combination of Langmuir probe diagnostics and 0-dimensional (global) plasma modeling. Both experimental and modeling procedures were carried out at constant total gas pressure (p = 10 mTorr), input power (W = 500 W), bias power (W-dc = 200 W) and O-2 fraction in a feed gas (y(O-2) = 11 %). The variable parameter was the HBr + Cl-2 mixing ratio, which was changed in the range of 0 - 89 % Cl-2. It was found that, under the given set of experimental conditions, the substitution of HBr for Cl-2: 1) results in increasing both mean electron energy and electron density; 2) causes the mon-monotonic (with a maximum at similar to 45 % Cl-2) change in Br atom density; and 3) provides an increase in O atom density at y(O-2) = const. The possible impacts of HBr + Cl-2 mixing ratio on Si and SiO2 etching kinetics were estimated through the analysis of model-predicted fluxes for plasma active species (Br, Cl and O atoms, positive ions). | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | IVANOVSKOGO KHIMIKO-TEKHNOLOGI TSHESKOGO INST | - |
dc.subject | MODEL-BASED ANALYSIS | - |
dc.subject | ETCHING CHARACTERISTICS | - |
dc.subject | SURFACE KINETICS | - |
dc.subject | GRUNBERG-NISSAN | - |
dc.subject | MIXTURES | - |
dc.subject | PROFILE | - |
dc.subject | CL-2 | - |
dc.subject | AR | - |
dc.subject | HE | - |
dc.title | PLASMA PARAMETERS AND KINETICS OF ACTIVE SPECIES IN HBr | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Kwon, Kwang-Ho | - |
dc.identifier.doi | 10.6060/ivkkt.20196207.5947 | - |
dc.identifier.scopusid | 2-s2.0-85071138119 | - |
dc.identifier.wosid | 000477768400008 | - |
dc.identifier.bibliographicCitation | IZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENII KHIMIYA I KHIMICHESKAYA TEKHNOLOGIYA, v.62, no.7, pp.72 - 79 | - |
dc.relation.isPartOf | IZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENII KHIMIYA I KHIMICHESKAYA TEKHNOLOGIYA | - |
dc.citation.title | IZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENII KHIMIYA I KHIMICHESKAYA TEKHNOLOGIYA | - |
dc.citation.volume | 62 | - |
dc.citation.number | 7 | - |
dc.citation.startPage | 72 | - |
dc.citation.endPage | 79 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Chemistry | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Multidisciplinary | - |
dc.subject.keywordPlus | MODEL-BASED ANALYSIS | - |
dc.subject.keywordPlus | ETCHING CHARACTERISTICS | - |
dc.subject.keywordPlus | SURFACE KINETICS | - |
dc.subject.keywordPlus | GRUNBERG-NISSAN | - |
dc.subject.keywordPlus | MIXTURES | - |
dc.subject.keywordPlus | PROFILE | - |
dc.subject.keywordPlus | CL-2 | - |
dc.subject.keywordPlus | AR | - |
dc.subject.keywordPlus | HE | - |
dc.subject.keywordAuthor | plasma parameters | - |
dc.subject.keywordAuthor | reaction rate | - |
dc.subject.keywordAuthor | halogen atom flux | - |
dc.subject.keywordAuthor | ion energy flux | - |
dc.subject.keywordAuthor | Si and SiO2 etching rates | - |
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