Low-Temperature Hybrid Dopant Activation Technique Using Pulsed Green Laser for Heavily-Doped n-Type SiGe Source/Drain
- Authors
- Kim, Seung-Geun; Kim, Gwang-Sik; Kim, Seung-Hwan; Yu, Hyun-Yong
- Issue Date
- 12월-2018
- Publisher
- IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
- Keywords
- CMOS technology; hybrid dopant activation technique; low-temperature doping method; pulsed green laser; SiGe source/drain
- Citation
- IEEE ELECTRON DEVICE LETTERS, v.39, no.12, pp.1828 - 1831
- Indexed
- SCIE
SCOPUS
- Journal Title
- IEEE ELECTRON DEVICE LETTERS
- Volume
- 39
- Number
- 12
- Start Page
- 1828
- End Page
- 1831
- URI
- https://scholar.korea.ac.kr/handle/2021.sw.korea/71307
- DOI
- 10.1109/LED.2018.2875751
- ISSN
- 0741-3106
- Abstract
- We present a novel hybrid dopant activation technique for n-type silicon-germanium (SiGe) to achieve high doping concentration and ultra-shallow junction at low temperature (<= 500 degrees C) using rapid thermal annealing and pulsed green laser post- annealing (hybrid RTA-GLA). The hybrid RTA-GLA process achieved one of the highest surface and peak doping concentrationsof 1.82x10(20) cm(-3) and 9.27 x 10(20) cm(-3), respectively, compared with low-temperature doping techniques for n-type SiGe. In addition, the n-type SiGe films doped by the hybrid RTA-GLA process provide ultra-shallow (<60 nm) and abrupt (5 nm/decade) junctions. This advanced low-temperature hybrid dopant activation technique is a promising method for developing SiGe-based electronics.
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - College of Engineering > School of Electrical Engineering > 1. Journal Articles
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.