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Lithography-free fabrication of field effect transistor channels with randomly contact-printed black phosphorus flakes

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dc.contributor.authorYoo, Seolhee-
dc.contributor.authorKim, Sangsig-
dc.contributor.authorSong, Yong-Won-
dc.date.accessioned2021-09-02T04:05:45Z-
dc.date.available2021-09-02T04:05:45Z-
dc.date.created2021-06-19-
dc.date.issued2018-11-01-
dc.identifier.issn1369-8001-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/71903-
dc.description.abstractBlack phosphorus (BP) has distinctive properties of tunable direct band gap as a semiconductor material, and both high carrier mobility and on/off switching performance for electronic devices, but has a significant drawback of material degradation in ambient atmosphere. Also, unlike graphene or MoS2 , BP is only synthesized in bulk shapes limiting the fabrication of thin film-based devices. We demonstrated a contact printing process for BP field effect transistors (FET) with the steps of mechanical exfoliation of BP flakes and their randomized stamping in dry-transfer regime. The contact printing featured by fast, continuous and solvent-free process on the pre-patterned electrodes guarantees high process efficiency providing immunity against the chemical degradation of BP layers. With asymmetric I-V characteristics, the resultant BP-channelized FET shows the electrical properties of on/off current ratio, hole mobility, and subthreshold swing as > 10(2) , similar to 130 cm(2)/Vs, and similar to 4.6 V/dec, respectively.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherELSEVIER SCI LTD-
dc.subjectPHOTORESPONSE-
dc.titleLithography-free fabrication of field effect transistor channels with randomly contact-printed black phosphorus flakes-
dc.typeArticle-
dc.contributor.affiliatedAuthorKim, Sangsig-
dc.identifier.doi10.1016/j.mssp.2018.06.010-
dc.identifier.scopusid2-s2.0-85048964030-
dc.identifier.wosid000439119400008-
dc.identifier.bibliographicCitationMATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, v.86, pp.58 - 62-
dc.relation.isPartOfMATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING-
dc.citation.titleMATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING-
dc.citation.volume86-
dc.citation.startPage58-
dc.citation.endPage62-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.subject.keywordPlusPHOTORESPONSE-
dc.subject.keywordAuthorBlack phosphorus-
dc.subject.keywordAuthorField effect transistor-
dc.subject.keywordAuthorContact printing-
dc.subject.keywordAuthorLithography-free-
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