A low-noise silicon nitride nanopore device on a polymer substrate
- Authors
- Choi, Wook; Jeon, Eun-Seok; Chun, Kyoung-Yong; Kim, Young-Rok; Park, Kyeong-Beom; Kim, Ki-Bum; Han, Chang-Soo
- Issue Date
- 20-7월-2018
- Publisher
- PUBLIC LIBRARY SCIENCE
- Citation
- PLOS ONE, v.13, no.7
- Indexed
- SCIE
SCOPUS
- Journal Title
- PLOS ONE
- Volume
- 13
- Number
- 7
- URI
- https://scholar.korea.ac.kr/handle/2021.sw.korea/74317
- DOI
- 10.1371/journal.pone.0200831
- ISSN
- 1932-6203
- Abstract
- We report a novel low-noise nanopore device employing a polymer substrate. The Si substrate of a fabricated Si-substrate-based silicon nitride (Si3N4) membrane was replaced with a polymer substrate. As such, laser machining was used to make a micro-size hole through the polyimide (PI) substrate, and a thin Si3N4 membrane was then transferred onto the PI substrate. Finally, a nanopore was formed in the membrane using a transmission electron microscope for detection of biomolecules. Compared to the Si-substrate-based device, the dielectric noise was greatly reduced and the root-mean-square noise level was decreased from 146.7 to 5.4 pA. Using this device, the translocation of double-strand deoxyribonucleic acid (DNA) was detected with a high signal/noise (S/N) ratio. This type of device is anticipated to be available for future versatile sequencing technologies.
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Collections - College of Engineering > Department of Mechanical Engineering > 1. Journal Articles
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