Optically Patternable Metamaterial Below Diffraction Limit

Abstract

We report an optically patternable metamaterial (OPM) for ultraviolet nanolithography below the diffraction limit. The OPM features monolayered silver nanoislands embedded within a photosensitive, polymer by using spin-coating of an ultrathin polymer, oblique angle deposition, and, solid-state embedment of silver nanoislands. This unique configuration simultaneously exhibits both negative effective permittivity and high image contrast in the ultraviolet range; which enables the: surface plasmon excitation for the gear, photolithographic definition of minimum feature size of 70 nm (less than or similar to lambda/5) beyond the near-field-zone. This-new meta material provides anew class of photoresist for ultraviolet nanolithogrphy below the diffraction limit.