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Charge-trap flash memory using zirconium-nitride-based memristor switches

Authors
Kim, Hee-DongKim, Kyeong HeonAn, Ho-MyoungKim, Tae Geun
Issue Date
11-11월-2015
Publisher
IOP PUBLISHING LTD
Keywords
ZrN; ReCTF; memristor switch; blocking layer; filament
Citation
JOURNAL OF PHYSICS D-APPLIED PHYSICS, v.48, no.44
Indexed
SCIE
SCOPUS
Journal Title
JOURNAL OF PHYSICS D-APPLIED PHYSICS
Volume
48
Number
44
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/91918
DOI
10.1088/0022-3727/48/44/445102
ISSN
0022-3727
Abstract
Charge-trap flash (CTF) memory using a zirconium nitride (ZrN)-based memristor switch (MRS) is demonstrated for next-generation nonvolatile memory. This device consists of a metal/MRS/nitride/oxide/silicon (M/MRS/N/O/S) structure so that electrical transport via the ZrN-based MRS layer can be utilized. Compared to previous oxide materials used as conduction paths, the proposed CTF device with a ZrN-based MRS exhibits a faster program/erase switching speed (20 ns/7 ns), along with comparable endurance and retention properties.
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