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In Situ Nanolithography with Sub-10 nm Resolution Realized by Thermally Assisted Spin-Casting of a Self-Assembling Polymer
- Authors
- Lee, Jung Hye; Kim, YongJoo; Cho, Joong-Yeon; Yang, Se Ryeun; Kim, Jong Min; Yim, Soonmin; Lee, Heon; Jung, Yeon Sik
- Issue Date
- 2-9월-2015
- Publisher
- WILEY-V C H VERLAG GMBH
- Keywords
- block copolymers; directed self-assembly; sub-10 nm; warm spin-casting
- Citation
- ADVANCED MATERIALS, v.27, no.33, pp.4814 - 4822
- Indexed
- SCIE
SCOPUS
- Journal Title
- ADVANCED MATERIALS
- Volume
- 27
- Number
- 33
- Start Page
- 4814
- End Page
- 4822
- ISSN
- 0935-9648
- Abstract
- In situ nanolithography is realized based on warm spin-casting of block copolymer solutions. This advancement is based on Si-containing block copolymers with an appropriate thermodynamic driving force for spontaneous phase-separation combined with the thermal assistance provided by slight temperature elevations during the spin-casting. Sub-10 nm half-pitch nanoscale patterns are produced within 30 s without a separate annealing process.
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