Effect of deposition pressure on the electrical properties of nitrogen-doped amorphous carbon films
DC Field | Value | Language |
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dc.contributor.author | Oh, Hyungon | - |
dc.contributor.author | Cho, Kyoungah | - |
dc.contributor.author | Kim, Sangsig | - |
dc.date.accessioned | 2021-09-04T13:48:24Z | - |
dc.date.available | 2021-09-04T13:48:24Z | - |
dc.date.created | 2021-06-18 | - |
dc.date.issued | 2015-08 | - |
dc.identifier.issn | 0374-4884 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/92844 | - |
dc.description.abstract | In this study, we investigate the effect of the deposition pressure on the electrical properties of nitrogen-doped amorphous carbon (a-C:N) films deposited by using an unbalanced DC magnetron sputtering method. As the deposition pressure is decreased from 9 to 1 mTorr, the resistivity decreases from 7.88 to 2.68 x 10 (-2) Omega center dot cm while the deposition rate increases from 3.5 to 4.4 nm/min. The decrease in resistivity is caused by increases in both the carrier concentration and mobility. As the pressure is decreased, the carrier concentration increases from 1.9 x 10(14) to 7.8 x 10(20) cm (-3), and the mobility increases from 0.01 to 0.3 cm(2)/V center dot sec. X-ray photoelectron spectroscopy and Raman spectroscopy reveal that the improved electrical properties of the film deposited at a lower pressure are the result of a higher fraction of sp(2) bonding. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | KOREAN PHYSICAL SOC | - |
dc.subject | DIAMOND-LIKE CARBON | - |
dc.subject | RAMAN-SPECTROSCOPY | - |
dc.subject | PERFORMANCE | - |
dc.title | Effect of deposition pressure on the electrical properties of nitrogen-doped amorphous carbon films | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Cho, Kyoungah | - |
dc.contributor.affiliatedAuthor | Kim, Sangsig | - |
dc.identifier.doi | 10.3938/jkps.67.638 | - |
dc.identifier.scopusid | 2-s2.0-84940942904 | - |
dc.identifier.wosid | 000360712400005 | - |
dc.identifier.bibliographicCitation | JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.67, no.4, pp.638 - 642 | - |
dc.relation.isPartOf | JOURNAL OF THE KOREAN PHYSICAL SOCIETY | - |
dc.citation.title | JOURNAL OF THE KOREAN PHYSICAL SOCIETY | - |
dc.citation.volume | 67 | - |
dc.citation.number | 4 | - |
dc.citation.startPage | 638 | - |
dc.citation.endPage | 642 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.identifier.kciid | ART002021076 | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.description.journalRegisteredClass | kci | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Physics, Multidisciplinary | - |
dc.subject.keywordPlus | DIAMOND-LIKE CARBON | - |
dc.subject.keywordPlus | RAMAN-SPECTROSCOPY | - |
dc.subject.keywordPlus | PERFORMANCE | - |
dc.subject.keywordAuthor | Nitrogen-doped amorphous carbon | - |
dc.subject.keywordAuthor | DC magnetron sputtering | - |
dc.subject.keywordAuthor | Bonding state | - |
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