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Controllable and air-stable graphene n-type doping on phosphosilicate glass for intrinsic graphene

Authors
Park, Hyung-YoulYoon, Jin-SangJeon, JeahoKim, JinokJo, Seo-HyeonYu, Hyun-YongLee, SungjooPark, Jin-Hong
Issue Date
7월-2015
Publisher
ELSEVIER SCIENCE BV
Citation
ORGANIC ELECTRONICS, v.22, pp.117 - 121
Indexed
SCIE
SCOPUS
Journal Title
ORGANIC ELECTRONICS
Volume
22
Start Page
117
End Page
121
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/93220
DOI
10.1016/j.orgel.2015.03.039
ISSN
1566-1199
Abstract
We proposed and investigated a controllable air-stable graphene n-doping method on phosphosilicate glass (PSG) to achieve intrinsic graphene. Through Raman, XPS, and AFM analyses, it was confirmed that the initially p-type doped graphene was recovered to intrinsic graphene through n-type doping phenomenon. The n-doping control was accomplished by adjusting the concentration of the out-diffused P2O5 molecules from the PSG layer. In particular, a larger amount of P2O5 molecules and a smoother PSG surface were achieved after the higher temperature annealing, consequently yielding a larger doping impact on the graphene layer. Finally, a very small Dirac point shift (1-3 V) was observed after 96 h of air exposure, compared to the degree of shift by the n-doping effect (17-36 V), demonstrating that this n-doping method is fairly stable in air. (C) 2015 Elsevier B.V. All rights reserved.
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