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Resistive switching characteristics of polycrystalline SrTiO3 films

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dc.contributor.authorChoi, Hyung Jong-
dc.contributor.authorPark, Suk Won-
dc.contributor.authorHan, Gwon Deok-
dc.contributor.authorNa, Junhong-
dc.contributor.authorKim, Gyu-Tae-
dc.contributor.authorShim, Joon Hyung-
dc.date.accessioned2021-09-05T07:51:05Z-
dc.date.available2021-09-05T07:51:05Z-
dc.date.created2021-06-15-
dc.date.issued2014-06-16-
dc.identifier.issn0003-6951-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/98216-
dc.description.abstractStrontium titanate (STO) thin films 90 nm in thickness were grown on a Pt substrate through atomic layer deposition (ALD). The as-deposited ALD STO grown with an ALD cycle ratio of 1:1 (Sr:Ti) was in an amorphous phase, and annealing at 800 degrees C in air crystallized the films into the perovskite phase. This phase change was confirmed by x-ray diffraction and transmission electron microscopy. The as-deposited ALD STO exhibited no discernible switching mechanism, whereas unipolar switching behavior was reproducibly observed with a high resistance ratio (10(8)-10(9)) and strict separation of the set/reset voltages and currents in the annealed ALD STO. Mechanisms for charge transport in both the low- and high-resistance states and for resistive switching in the annealed ALD STO are also proposed. (C) 2014 AIP Publishing LLC.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherAMER INST PHYSICS-
dc.subjectATOMIC LAYER DEPOSITION-
dc.subjectTHIN-FILMS-
dc.subjectRESISTANCE-
dc.titleResistive switching characteristics of polycrystalline SrTiO3 films-
dc.typeArticle-
dc.contributor.affiliatedAuthorKim, Gyu-Tae-
dc.contributor.affiliatedAuthorShim, Joon Hyung-
dc.identifier.doi10.1063/1.4883646-
dc.identifier.scopusid2-s2.0-84903211254-
dc.identifier.wosid000337915000035-
dc.identifier.bibliographicCitationAPPLIED PHYSICS LETTERS, v.104, no.24-
dc.relation.isPartOfAPPLIED PHYSICS LETTERS-
dc.citation.titleAPPLIED PHYSICS LETTERS-
dc.citation.volume104-
dc.citation.number24-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusATOMIC LAYER DEPOSITION-
dc.subject.keywordPlusTHIN-FILMS-
dc.subject.keywordPlusRESISTANCE-
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