Thickness dependent low-frequency noise characteristics of a-InZnO thin-film transistors under light illumination
- Authors
- Choi, Hyun-Sik; Jeon, Sanghun
- Issue Date
- 13-1월-2014
- Publisher
- AMER INST PHYSICS
- Citation
- APPLIED PHYSICS LETTERS, v.104, no.2
- Indexed
- SCIE
SCOPUS
- Journal Title
- APPLIED PHYSICS LETTERS
- Volume
- 104
- Number
- 2
- URI
- https://scholar.korea.ac.kr/handle/2021.sw.korea/99544
- DOI
- 10.1063/1.4862318
- ISSN
- 0003-6951
- Abstract
- The influence of illumination on the electrical characteristics of amorphous indium-zinc oxide (a-IZO) thin-film transistors (TFTs) has been investigated. The electrical properties are found to depend significantly on the active thickness (TIZO) of the a-IZO TFT. The active thickness is seen to play a major role in the carrier transport mechanism. Based on the carrier fluctuation model, the low-frequency noise (LFN) characteristics of a-IZO devices of varying thicknesses were evaluated before as well as after illumination. Similar to the results of DC and capacitance-voltage (C-V) measurements, the LFN characteristics too show that the light-induced carrier transport becomes significantly enhanced for relatively thick (T-IZO >= 60 nm) a-IZO devices. (C) 2014 AIP Publishing LLC.
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Collections - College of Science and Technology > Display Convergence in Division of Display and Semiconductor Physics > 1. Journal Articles
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