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Influence of Ionizing Radiation on Short-Channel Effects in Low-Doped Multi-Gate MOSFETs

Authors
Nam, JungsikKang, Chang YongKim, Kwang PyoYeo, HyeopgooLee, Boung JunSeo, SungkyuYang, Ji-Woon
Issue Date
12월-2012
Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
Keywords
Double-gate MOSFETs; ionizing radiation; multi-gate MOSFETs; short-channel effects; total-ionizing dose
Citation
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, v.59, no.6, pp.3021 - 3026
Indexed
SCIE
SCOPUS
Journal Title
IEEE TRANSACTIONS ON NUCLEAR SCIENCE
Volume
59
Number
6
Start Page
3021
End Page
3026
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/106819
DOI
10.1109/TNS.2012.2226751
ISSN
0018-9499
Abstract
Effects of gamma-ray irradiation on short-channel effects (SCEs) in low-doped double-gate MOSFETs are experimentally examined for various fin widths and channel lengths. The different behavior of the effects in NMOS and PMOS devices are analyzed using three-dimensional (3-D) TCAD simulation. The physical interpretation for the influence of ionizing radiation on SCEs in low-doped multi-gate MOSFETs is provided. This successfully explains not only the degradation in NMOS, but also the improvement in PMOS for subthreshold characteristics by irradiation.
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