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Stable Bipolar Resistive Switching Characteristics and Resistive Switching Mechanisms Observed in Aluminum Nitride-based ReRAM Devices

Authors
Kim, Hee-DongAn, Ho-MyoungLee, Eui BokKim, Tae Geun
Issue Date
10월-2011
Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
Keywords
Atomic force microscopy (AFM); aluminum nitride (AlN); resistive switching (RS); space-charge-limited conduction (SCLC)
Citation
IEEE TRANSACTIONS ON ELECTRON DEVICES, v.58, no.10, pp.3566 - 3573
Indexed
SCIE
SCOPUS
Journal Title
IEEE TRANSACTIONS ON ELECTRON DEVICES
Volume
58
Number
10
Start Page
3566
End Page
3573
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/111520
DOI
10.1109/TED.2011.2162518
ISSN
0018-9383
Abstract
The authors report upon the ultrafast bipolar switching characteristics observed in aluminum nitride (AlN)-based resistive random access memory devices ReRAMs. The set and reset states were measured to be as low as 2 mu A and 5 nA, respectively, at V-read = 0.1 V. Regarding pulse operations, very fast switching characteristics were achieved at 3 V/10 ns for the set operation and -3 V/10 ns for the reset operation. In addition, the AlN-based ReRAMs showed an endurance value of over similar to 10(8) cycles and a retention time of over ten years at 85 degrees C. These results show that this AlN-based ReRAM can be used as a promising high-speed nonvolatile memory device.
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