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Development of higher performance indium tin oxide films at a very low temperature (< 80 degrees C) by the neutral beam-assisted sputtering process
- Authors
- Jang, Jin Nyoung; Lee, You Jong; Lee, Jun Young; Jang, Yun Sung; Hong, MunPyo; Oh, Kyoung Suk; Yoo, Suk Jae; Kim, Daechul; Lee, Bonju; Jang, Won-Gun
- Issue Date
- 31-1월-2011
- Publisher
- ELSEVIER SCIENCE SA
- Keywords
- Neutral beam assisted deposition; Indium tin oxide; Low temperature deposition; Sputtering; Nano crystalline
- Citation
- THIN SOLID FILMS, v.519, no.7, pp.2098 - 2102
- Indexed
- SCIE
SCOPUS
- Journal Title
- THIN SOLID FILMS
- Volume
- 519
- Number
- 7
- Start Page
- 2098
- End Page
- 2102
- ISSN
- 0040-6090
- Abstract
- At very low temperatures (<80 degrees C), improved performance indium tin oxide (ITO) thin films with a low resistivity of 4.22 x 10(-4) Omega cm and high transmittance >90% at 550 nm were developed using the neutral beam-assisted sputtering (NBAS) technique, which included a cyclic inter-treatment process with an Ar neutral beam. Transmission electron microscopy and electron diffraction showed that the neutral particles with hyper-thermal energy was able to enhance the formation of the nano-crystalline phase and activate the dopant without additional heating or plasma damage during ITO thin film deposition. (C) 2010 Elsevier B.V. All rights reserved.
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