Maskless optical microscope lithography system
- Authors
- Park, Eung Seok; Jang, Doyoung; Lee, Jaewoo; Kim, Yun Jeong; Na, Junhong; Ji, Hyunjin; Choi, Jae Wan; Kim, Gyu-Tae
- Issue Date
- 12월-2009
- Publisher
- AMER INST PHYSICS
- Citation
- REVIEW OF SCIENTIFIC INSTRUMENTS, v.80, no.12
- Indexed
- SCIE
SCOPUS
- Journal Title
- REVIEW OF SCIENTIFIC INSTRUMENTS
- Volume
- 80
- Number
- 12
- URI
- https://scholar.korea.ac.kr/handle/2021.sw.korea/118789
- DOI
- 10.1063/1.3266965
- ISSN
- 0034-6748
- Abstract
- A simple maskless photolithography system employing an optical microscope, a motorized stage and a beam blanker is proposed. Based on a pattern design, the motorized stage shifts a resist-coated substrate exposed by a focused beam under a microscope. Microscale patterns are easily defined on a single nanowire without using a mask validating the application applying to the research requiring frequent changes or free-style designs in microscale test patterns. (C) 2009 American Institute of Physics. [doi: 10.1063/1.3266965]
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- There are no files associated with this item.
- Appears in
Collections - Graduate School > Department of Electronics and Information Engineering > 1. Journal Articles
- College of Engineering > School of Electrical Engineering > 1. Journal Articles
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