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The deposition of amorphous carbon thin films for hard mask applications by reactive particle beam assisted sputtering process

Authors
Lee, TaehoonMin, Nam-KiLee, Hyun WooJang, JinNyoungLee, DongHyuckHong, MunPyoKwon, Kwang-Ho
Issue Date
29-5월-2009
Publisher
ELSEVIER SCIENCE SA
Keywords
Amorphous carbon film; Reactive Particle Beam assisted sputtering system; Raman spectroscopy; Ellipsometry
Citation
THIN SOLID FILMS, v.517, no.14, pp.3999 - 4002
Indexed
SCIE
SCOPUS
Journal Title
THIN SOLID FILMS
Volume
517
Number
14
Start Page
3999
End Page
4002
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/120012
DOI
10.1016/j.tsf.2009.01.112
ISSN
0040-6090
Abstract
In this work, amorphous carbon thin films for hard mask applications were deposited by a reactive particle beam (RPB) assisted sputtering system at room temperature. The deposition characteristics of the films were investigated as functions of operating parameters such as reflector bias voltage and RF plasma power. By spectroscopic ellipsometry, the decrease in the refractive index of films at the wavelengths of 633 and 248 nm was observed with the increasing plasma power. In Raman spectra, the positions of G line shifted to higher wavenumbers; with increasing plasma power. When the reflector bias voltage increases, the deposition rate was increased but the positions of G line remained nearly unchanged. (C) 2009 Elsevier B.V. All rights reserved.
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College of Science and Technology > Department of Electro-Mechanical Systems Engineering > 1. Journal Articles
Graduate School > Department of Applied Physics > 1. Journal Articles
Graduate School > Department of Control and Instrumentation Engineering > 1. Journal Articles

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