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Visualization of local gate control in a ZnO inter-nanowire junction device

Authors
Lim, Jin-HyungJi, Hyun JinJung, Goo-EunChung, Kyung HoonKim, Gyu-TaeHa, Jeong SookPark, Ji-YongKahng, Se-Jong
Issue Date
Mar-2009
Publisher
PERGAMON-ELSEVIER SCIENCE LTD
Keywords
Nanowire; Scanning gate microscopy; Atomic force microscopy
Citation
SOLID-STATE ELECTRONICS, v.53, no.3, pp.320 - 323
Indexed
SCIE
SCOPUS
Journal Title
SOLID-STATE ELECTRONICS
Volume
53
Number
3
Start Page
320
End Page
323
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/120471
DOI
10.1016/j.sse.2009.01.001
ISSN
0038-1101
Abstract
Electronic transport behavior of a ZnO inter-nanowire junction transistor was studied with atomic force microscopy (AFM) and scanning gate microscopy. Source-drain currents exhibit strong dependences on gate voltage, applied by a movable local gate. Noticeable local gating was observed when the tip is above the junction area of the inter-nanowire device, demonstrating that active region in the device is confined. Transport mechanism in the device was understood in terms of band bending by electronic doping. Our device structure is analogous to that of two ZnO grains separated by an insulating layer in polycrystalline varistor devices. (C) 2009 Elsevier Ltd. All rights reserved.
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