Model-based analysis of the ZrO2 etching mechanism in inductively coupled BCl3/Ar and BCl3/CHF3/Ar Plasmas
DC Field | Value | Language |
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dc.contributor.author | Kim, Mansu | - |
dc.contributor.author | Min, Nam-Ki | - |
dc.contributor.author | Yun, Sun Jin | - |
dc.contributor.author | Lee, Hyun Woo | - |
dc.contributor.author | Efremov, Alexander M. | - |
dc.contributor.author | Kwon, Kwang-Ho | - |
dc.date.accessioned | 2021-09-09T07:48:19Z | - |
dc.date.available | 2021-09-09T07:48:19Z | - |
dc.date.created | 2021-06-10 | - |
dc.date.issued | 2008-06 | - |
dc.identifier.issn | 1225-6463 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/123438 | - |
dc.description.abstract | The etching mechanism of ZrO2 thin films and etch selectivity over some materials in both BCl3/Ar and BCl3/CBY3/Ar plasmas are investigated using a combination of experimental and modeling methods. To obtain the data on plasma composition and fluxes of active species, global (0-dimensional) plasma models are developed with Langmuir probe diagnostics data. In BCl3/Ar plasma, changes in gas mixing ratio result in non-linear changes of both densities and fluxes for Cl, BCl2, and BCl2+. In this work, it is shown that the non-monotonic behavior of the ZrO2 etch rate as a function of the BCl3/Ar mixing ratio could be related to the ion-assisted etch mechanism and the ion-flux-limited etch regime. The addition of up to 33% CHF3 to the BCl3-rich BCl3/Ar plasma does not influence the ZrO2 etch rate, but it non-monotonically changes the etch rates of both Si and SiO2. The last effect can probably be associated with the corresponding behavior of the F atom density. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | WILEY | - |
dc.subject | DIELECTRIC-CONSTANT MATERIALS | - |
dc.subject | HIGH-DENSITY PLASMA | - |
dc.subject | GAS MIXING-RATIO | - |
dc.subject | ZIRCONIUM-OXIDE | - |
dc.subject | GLOBAL-MODEL | - |
dc.subject | SILICON | - |
dc.subject | CHEMISTRIES | - |
dc.subject | DISCHARGES | - |
dc.subject | DEPOSITION | - |
dc.subject | FILMS | - |
dc.title | Model-based analysis of the ZrO2 etching mechanism in inductively coupled BCl3/Ar and BCl3/CHF3/Ar Plasmas | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Min, Nam-Ki | - |
dc.contributor.affiliatedAuthor | Kwon, Kwang-Ho | - |
dc.identifier.doi | 10.4218/etrij.08.0107.0206 | - |
dc.identifier.scopusid | 2-s2.0-45949110082 | - |
dc.identifier.wosid | 000256685900005 | - |
dc.identifier.bibliographicCitation | ETRI JOURNAL, v.30, no.3, pp.383 - 393 | - |
dc.relation.isPartOf | ETRI JOURNAL | - |
dc.citation.title | ETRI JOURNAL | - |
dc.citation.volume | 30 | - |
dc.citation.number | 3 | - |
dc.citation.startPage | 383 | - |
dc.citation.endPage | 393 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.identifier.kciid | ART001263631 | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.description.journalRegisteredClass | kci | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Telecommunications | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.relation.journalWebOfScienceCategory | Telecommunications | - |
dc.subject.keywordPlus | DIELECTRIC-CONSTANT MATERIALS | - |
dc.subject.keywordPlus | HIGH-DENSITY PLASMA | - |
dc.subject.keywordPlus | GAS MIXING-RATIO | - |
dc.subject.keywordPlus | ZIRCONIUM-OXIDE | - |
dc.subject.keywordPlus | GLOBAL-MODEL | - |
dc.subject.keywordPlus | SILICON | - |
dc.subject.keywordPlus | CHEMISTRIES | - |
dc.subject.keywordPlus | DISCHARGES | - |
dc.subject.keywordPlus | DEPOSITION | - |
dc.subject.keywordPlus | FILMS | - |
dc.subject.keywordAuthor | ZrO2 | - |
dc.subject.keywordAuthor | etch rate | - |
dc.subject.keywordAuthor | dissociation | - |
dc.subject.keywordAuthor | ionization | - |
dc.subject.keywordAuthor | etch mechanism | - |
dc.subject.keywordAuthor | BCl3/Ar and BCl3/CHF3/Ar plasma modeling | - |
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