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Model-Based Analysis of Plasma Parameters and Active Species Kinetics in Cl(2)/X (X = Ar, He, N(2)) Inductively Coupled Plasmas

Authors
Efremov, AlexanderMin, Nam-KiChoi, Bok-GilBaek, Kyu-HaKwon, Kwang-Ho
Issue Date
2008
Publisher
ELECTROCHEMICAL SOC INC
Keywords
Active species kinetics; Plasma parameter; ICP
Citation
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.155, no.12, pp.D777 - D782
Indexed
SCIE
SCOPUS
Journal Title
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume
155
Number
12
Start Page
D777
End Page
D782
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/125497
DOI
10.1149/1.2993160
ISSN
0013-4651
Abstract
This work reports the influence of gas mixing ratio on the Cl(2)/Ar, Cl(2)/He, and Cl(2)/N(2) plasma parameters, steady-state densities, and fluxes of active species in the planar inductively coupled plasma reactor. The investigation combined plasma diagnostics by Langmuir probes and quadrupole mass spectroscopy with a global (zero-dimensional) plasma model. It was shown that the dilution of Cl(2) by any additive gas results in a noticeable change in both the electron temperature and density, as well as provides the acceleration in the electron impact dissociation kinetics of Cl(2) molecules. No qualitative differences for the given three systems in regard to relative changes in active species densities and model-predicted etch rate behaviors were obtained. (C) 2008 The Electrochemical Society. [DOI: 10.1149/1.2993160] All rights reserved.
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