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Controlling of oxygen impurity and crystal fraction in nano-crytal silicon thin film processed with low hydrogen dilution gas system at near room temperature by using neutral beam assisted CVD
- Authors
- Hong MunPyo
- Issue Date
- 23-1월-2014
- Publisher
- ITC 2014 – 10th International Thin-Film Transistor Conference
- Citation
- ITC 2014 – 10th International Thin-Film Transistor Conference
- Conference Name
- ITC 2014 – 10th International Thin-Film Transistor Conference
- Place
- NE
- Conference Date
- 2014-01-23
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Collections - Graduate School > Department of Applied Physics > 2. Conference Papers
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