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Beyond the Current Horizontal of Silicon Thin Film Technology: Light-Soaking Free Nano-Crystal Embedded Polymorphous Silicon Thin Film and TFT by Neutral Beam Assisted CVD at Room Temperature
- Authors
- Hong MunPyo
- Issue Date
- 9-10월-2012
- Publisher
- the Eletrochemical Society of Japan
- Citation
- PRiME 2012
- Conference Name
- PRiME 2012
- Place
- US
327,Level3, Hawaii Convention Center
- Conference Date
- 2012-10-07
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- There are no files associated with this item.
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Collections - Graduate School > Department of Applied Physics > 2. Conference Papers
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