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Effect of fluorine ions on wet etching behavior of copper/molybdenum in acidic solutions

Authors
Hong MunPyo
Issue Date
6-7월-2012
Publisher
ICMAP 2012 (The 4th International Conference on Microelectronics and Plasma Technology)
Citation
ICMAP 2012 (The 4th International Conference on Microelectronics and Plasma Technology)
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/45697
Conference Name
ICMAP 2012 (The 4th International Conference on Microelectronics and Plasma Technology)
Place
KO
Conference Date
2012-07-04
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Graduate School > Department of Applied Physics > 2. Conference Papers

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