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Etching Characteristics and Mechanism of VO2 in inductively coupled plasma

Authors
Hong MunPyo
Issue Date
24-Jun-2008
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/56933
Conference Name
Proceeding on the 4th Asia Pacific Conference on Transducers and Micro/Nano Technology
Place
대만
tainan, Taiwan
Conference Date
2008-06-22 ~ 2008-06-25
Conference Name
The 4th Asia Pacific Conference on Transducers and Micro/Nano Technology
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