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Lithography-free fabrication of field effect transistor channels with randomly contact-printed black phosphorus flakes

Authors
Yoo, SeolheeKim, SangsigSong, Yong-Won
Issue Date
1-11월-2018
Publisher
ELSEVIER SCI LTD
Keywords
Black phosphorus; Field effect transistor; Contact printing; Lithography-free
Citation
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, v.86, pp.58 - 62
Indexed
SCIE
SCOPUS
Journal Title
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
Volume
86
Start Page
58
End Page
62
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/71903
DOI
10.1016/j.mssp.2018.06.010
ISSN
1369-8001
Abstract
Black phosphorus (BP) has distinctive properties of tunable direct band gap as a semiconductor material, and both high carrier mobility and on/off switching performance for electronic devices, but has a significant drawback of material degradation in ambient atmosphere. Also, unlike graphene or MoS2 , BP is only synthesized in bulk shapes limiting the fabrication of thin film-based devices. We demonstrated a contact printing process for BP field effect transistors (FET) with the steps of mechanical exfoliation of BP flakes and their randomized stamping in dry-transfer regime. The contact printing featured by fast, continuous and solvent-free process on the pre-patterned electrodes guarantees high process efficiency providing immunity against the chemical degradation of BP layers. With asymmetric I-V characteristics, the resultant BP-channelized FET shows the electrical properties of on/off current ratio, hole mobility, and subthreshold swing as > 10(2) , similar to 130 cm(2)/Vs, and similar to 4.6 V/dec, respectively.
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Kim, Sang sig
공과대학 (전기전자공학부)
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