Novel Conductive Filament Metal-Interlayer-Semiconductor Contact Structure for Ultralow Contact Resistance Achievement
- Authors
- Kim, Seung-Hwan; Kim, Gwang-Sik; Park, June; Lee, Changmin; Kim, Hyoungsub; Kim, Jiyoung; Sim, Joon Hyung; Yu, Hyun-Yong
- Issue Date
- 8-8월-2018
- Publisher
- AMER CHEMICAL SOC
- Keywords
- conductive filament; metal-induced gap state; fermi-level pinning; metal-interlayer-semiconductor structure; source/drain contact; III-V semiconductor
- Citation
- ACS APPLIED MATERIALS & INTERFACES, v.10, no.31, pp.26378 - 26386
- Indexed
- SCIE
SCOPUS
- Journal Title
- ACS APPLIED MATERIALS & INTERFACES
- Volume
- 10
- Number
- 31
- Start Page
- 26378
- End Page
- 26386
- URI
- https://scholar.korea.ac.kr/handle/2021.sw.korea/73786
- DOI
- 10.1021/acsami.8b07066
- ISSN
- 1944-8244
- Abstract
- In the post-Moore era, it is well-known that contact resistance has been a critical issue in determining the performance of complementary metal-oxide-semiconductor (CMOS) reaching physical limits. Conventional Ohmic contact techniques, however, have hindered rather than helped the development of CMOS technology reaching its limits of scaling. Here, a novel conductive filament metal-interlayer-semiconductor (CF-MIS) contact-which achieves ultralow contact resistance by generating CFs and lowering Schottky barrier height (SBH)-is investigated for potential applications in various nanodevices in lieu of conventional Ohmic contacts. This universal and innovative technique, CF-MIS contact, forming the CFs to provide a quantity of electron paths as well as tuning SBH of semiconductor is first introduced. The proposed CF-MIS contact achieves ultralow specific contact resistivity, exhibiting up to similar to x700 000 reduction compared to that of the conventional metal-semiconductor contact. This study proves the viability of CF-MIS contacts for future Ohmic contact schemes and that they can easily be extended to mainstream electronic nanodevices that suffer from significant contact resistance problems.
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Collections - College of Engineering > Department of Mechanical Engineering > 1. Journal Articles
- College of Engineering > School of Electrical Engineering > 1. Journal Articles
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