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Extremely Low Contact Resistance on Graphene through n-Type Doping and Edge Contact Design
- Authors
- Park, Hyung-Youl; Jung, Woo-Shik; Kang, Dong-Ho; Jeon, Jaeho; Yoo, Gwangwe; Park, Yongkook; Lee, Jinhee; Jang, Yun Hee; Lee, Jaeho; Park, Seongjun; Yu, Hyun-Yong; Shin, Byungha; Lee, Sungjoo; Park, Jin-Hong
- Issue Date
- 3-Feb-2016
- Publisher
- WILEY-V C H VERLAG GMBH
- Keywords
- contact resistance; doping; edge contact; graphene; optoelectronic devices
- Citation
- ADVANCED MATERIALS, v.28, no.5, pp.864 - 870
- Indexed
- SCIE
SCOPUS
- Journal Title
- ADVANCED MATERIALS
- Volume
- 28
- Number
- 5
- Start Page
- 864
- End Page
- 870
- ISSN
- 0935-9648
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - College of Engineering > School of Electrical Engineering > 1. Journal Articles
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Related Researcher
- Yu, Hyun Yong
- College of Engineering (School of Electrical Engineering)