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Investigation on the Performance of Vanadium-InZnO Thin Film Transistors Fabricated by Sol-Gel Method

Authors
Choi, Jun YoungKim, Sang SigLee, Sang Yeol
Issue Date
4월-2014
Publisher
AMER SCIENTIFIC PUBLISHERS
Keywords
Solution Process; VIZO; Threshold Voltage
Citation
JOURNAL OF NANOELECTRONICS AND OPTOELECTRONICS, v.9, no.2, pp.173 - 176
Indexed
SCIE
SCOPUS
Journal Title
JOURNAL OF NANOELECTRONICS AND OPTOELECTRONICS
Volume
9
Number
2
Start Page
173
End Page
176
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/98871
DOI
10.1166/jno.2014.1557
ISSN
1555-130X
Abstract
We have investigated the Influence of the annealing temperature and incorporation of vanadium contents on the electrical properties of solution processed vanadium-indium-zinc oxide (VIZO) thin-film transistors (TFTs). At 300 degrees C annealing, the VIZO TFTs shows on/off ratio of 1.6 x 10(6) and filed effect mobility of 1.49 cm(2)/Vs. The threshold voltage (Vth) is shifted toward a negative direction and a field-effect mobility (mu(FE)) was increased with the increase of annealing temperature. Chemical, physical and electrical analysis on VIZO films and TFTs at various annealing temperatures were executed and compared. Vanadium could be expected to be role as a carrier suppressor in the VIZO system. This proposed that the performance of VIZO TFTs can be controlled by the V molar ratio in the VIZO based TFTs.
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